Quantitative Analysis of Compound Semiconductors with an Ion Microanalyzer
نویسندگان
چکیده
منابع مشابه
Amorphization of elemental and compound semiconductors upon ion implantation
Cross-sectional TEM studies of ion implantation induced amorphization in a large number of semiconductors have been performed. Samples of Si, AlAs, GaAs, GaP, GaSb, InP, InAs, and ZnSe were simultaneously implanted at 77 K with 20 keV Si at doses between 1 x 10/cm and 1 x 10/cm. A dose of 1 x 10/cm minimized the ion beam induced epitaxial crystallization and sputtering effects. The depth of the...
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ژورنال
عنوان ژورنال: Journal of the Mass Spectrometry Society of Japan
سال: 1977
ISSN: 1884-3271,1340-8097
DOI: 10.5702/massspec1953.25.99